Critical issues in scanning electron microscope metrology

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Critical Issues in Scanning Electron Microscope Metrology

National Institute of Standards and Technology, Gaithersburg, MD 20899-0001 During the manufacturing of presentday integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various forms of scanning probe microscopies are major microscopical techniques...

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ژورنال

عنوان ژورنال: Journal of Research of the National Institute of Standards and Technology

سال: 1994

ISSN: 1044-677X

DOI: 10.6028/jres.099.059